Inheritance of siliquae bearing pattern was studied in Indian
mustard using F1, back cross (BC1, BC2) and F2 generations
derived from a cross NIF-V (clustered siliquae type) and
NRCHB 101 (dispersed siliquae type). Individual plants from
segregating generations were grouped into two phenotypic
classes viz. dispersed and clustered siliquae bearing
pattern.The dispersed pattern was dominant over clustered
siliquae bearing pattern. The estimated ratio of F2 plants
fitted to an assumed phenotypic ratio of 15 dispersed: 1
clustered. A two gene model, each with two alleles and
having duplicate gene action, is proposed to explain the
inheritance of siliquae bearing pattern in Indian mustard.
The information generated in this study will help in
developing breeding strategy for utilizing this trait to
redesign the mustard ideotype for high siliqua density.
Keywords: Clustered siliquae, dispersed siliquae, duplicate gene action, siliquae density
Year: 2014
Volume: 74
Issue: 4
Article DOI: 10.5958/0975-6906.2014.00879.7
Print ISSN: 0019-5200
Online ISSN: 0975-6906
J. Nanjundan, Karnal Singh, Arun Kumar and K. H. Singh info_circle